Cat-CVD-prepared oxygen-rich μc-Si:H for wide-bandgap material

Thin Solid Films

Volumn 490, Issue 2, 2005, Pages 173-176

  Matsumoto, Yasuhiro ^a   Ortega, Mauricio ^a   Peza, Juan Manuel ^a   Reyes, Mario Alfredo ^a   Escobosa, Arturo ^a  

^a DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

Amorphous silicon oxide; Cat CVD; Microcrystalline; Wide bandgap

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXYGEN; SILICON; TUNGSTEN; X RAY DIFFRACTION;

AMORPHOUS SILICON OXIDE; CAT-CVD; MICROCRYSTALLINE; WIDE BANDGAPS;

THIN FILM CIRCUITS;

EID: 24044485608     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.04.054     Document Type: Conference Paper

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