Dielectric properties of Si- Ba 0.5Sr 0.5TiO 3 composite thin films elaborated by pulsed laser deposition

Journal of Applied Physics

Volumn 98, Issue 3, 2005, Pages

  Cao, L Z ^a   Cheng, B L ^a   Wang, S Y ^a   Zhou, Y L ^a   Jin, K J ^a   Lu, H B ^a   Chen, Z H ^a   Yang, G Z ^a  

^a INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITE THIN FILMS; SI CONCENTRATION; TUNABILITY; UNDOPING;

ATOMIC FORCE MICROSCOPY; COMPOSITE MATERIALS; CRYSTAL STRUCTURE; DIELECTRIC LOSSES; MORPHOLOGY; PULSED LASER DEPOSITION; SILICON COMPOUNDS; SURFACES; X RAY DIFFRACTION ANALYSIS;

THIN FILMS;

EID: 23944477379     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1999852     Document Type: Article

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