Equations of exposure time and X-ray mask absorber thickness in the LIGA process

Microsystem Technologies

Volumn 7, Issue 1, 2001, Pages 1-5

  Gil, K H ^b   Lee, S S ^a   Youm, Y ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041905211     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s005420000062     Document Type: Article

References (7)

1. Becker EW; Ehrfeld W; Hagmann P; Maner A; Munchmeyer D (1986) Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA Process). J Microelectron Eng 4: 35-56
2. Bley P; Menz W; Bacher W; Feit K; Harmening M; Hein H; Mohr J; Schomburg WK; Stark W (1991) Application of the LIGA process in fabrication of three-dimensional mechanical microstructures. 1991 International Microprocess Conference, Kanazawa, Japan
3. Feiertag G; Ehrfeld W; Lehr H; Schmidt A; Schmidt M (1997) Calculation and experimental determination of the structure transfer accuracy in deep X-ray lithography. J Micromech Microeng 7: 323-331
4. Feldman M; Sun J (1992) Resolution limits in X-ray lithography. J Vac Sci Technol B 10(6): 3173-3176
5. Guckel H; Skrobis KJ; Klein J; Christenson TR (1994) Micromechanics via X-ray assisted processing. J Vac Sci Technol A 12(4): 2559-2563
6. Malek CK; Jackson KH; Bonivert WD; Hruby J (1996) Masks for high aspect ratio X-ray lithography. J Micromech Microeng 6: 228-235
7. Malek CK; Jackson K; Brennen RA; Hecht MH; Bonivert WD; Hruby J (1994) Deep etch X-ray lithography at the advanced light source: First Results. J Vac Sci Technol B 12(6): 4009-4012