Concentration mapping around copper microelectrodes studied by scanning electrochemical microscopy

Electrochemistry Communications

Volumn 7, Issue 9, 2005, Pages 962-968

  Gabrielli, C ^a   Ostermann, E ^a   Perrot, H ^a   Vivier, V ^a   Beitone, L ^b   Mace, C ^b  

^a CNRS   (France)

^b Altis Semiconductor   (France)

Author keywords

Copper; Dendrites; Microelectrodes; SECM

Indexed keywords

DISSOLUTION; ELECTROCHEMISTRY; ELECTROLYTES; ENERGY DISPERSIVE SPECTROSCOPY; IMAGING TECHNIQUES; MICROELECTRODES; SCANNING ELECTRON MICROSCOPY; SURFACE TREATMENT;

COPPER COMPLEXES; COPPER MICROELECTRODES; DENDRITES; SCANNING ELECTROCHEMICAL MICROSCOPY (SECM);

COPPER;

EID: 23844494775     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2005.06.018     Document Type: Article

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