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Volumn 26, Issue 8, 2005, Pages 566-568

Hot carrier-induced degradation in bulk FinFETs

Author keywords

Bulk FinFET; Degradation; Hot carrier effects

Indexed keywords

CRYSTAL ORIENTATION; ELECTRIC POTENTIAL; GATES (TRANSISTOR); HOT CARRIERS; SEMICONDUCTOR DEVICE STRUCTURES; SILICON NITRIDE; TRANSCONDUCTANCE;

EID: 23844461114     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2005.852534     Document Type: Article
Times cited : (45)

References (8)
  • 4
    • 20344371148 scopus 로고    scopus 로고
    • "Simulation study of a new body-tied FinFETs (Omega MOSFETs) using bulk Si wafers"
    • J.H. Lee, T. Park, E. Yoon, and Y. J. Park, "Simulation study of a new body-tied FinFETs (Omega MOSFETs) using bulk Si wafers," in Si Nanoelectron. Tech. Dig., 2003, pp. 102-103.
    • (2003) Si Nanoelectron. Tech. Dig. , pp. 102-103
    • Lee, J.H.1    Park, T.2    Yoon, E.3    Park, Y.J.4
  • 5
    • 0036163060 scopus 로고    scopus 로고
    • "Nanoscale CMOS spacer FinFETs for the terabit era"
    • Jan.
    • Y.-K. Choi, T.-J. King, and C. Hu, "Nanoscale CMOS spacer FinFETs for the terabit era," IEEE Electron Device Lett., vol. 23, no. 1, pp. 25-27, Jan. 2002.
    • (2002) IEEE Electron Device Lett. , vol.23 , Issue.1 , pp. 25-27
    • Choi, Y.-K.1    King, T.-J.2    Hu, C.3
  • 6
    • 0043166501 scopus 로고    scopus 로고
    • "Channel width dependence of NMOSFET hot-carrier degradation"
    • Jun.
    • E. Li and S. Prasad, "Channel width dependence of NMOSFET hot-carrier degradation," IEEE Trans. Electron Devices, vol. 50, no. 6, pp. 1545-1548, Jun. 2003.
    • (2003) IEEE Trans. Electron Devices , vol.50 , Issue.6 , pp. 1545-1548
    • Li, E.1    Prasad, S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.