MOCVD deposition of CoAl2O4 films

Electrochimica Acta

Volumn 50, Issue 23 SPEC. ISS., 2005, Pages 4592-4599

  Carta, G ^a   Casarin, M ^b   El Habra, N ^a   Natali, M ^a   Rossetto, G ^a   Sada, C ^b   Tondello, E ^b   Zanella, P ^a  

^a CNR   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

Author keywords

Annealing; Blue pigment; Cobalt aluminate; MOCVD; Spinel

Indexed keywords

ANNEALING; HEAT TREATMENT; METALLORGANIC CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

BLUE PIGMENTS; COBALT ALUMINATE; FILM MICROSTRUCTURE; SPINEL;

COBALT COMPOUNDS;

EID: 23844442552     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2004.10.094     Document Type: Article

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