Investigation of femtosecond laser irradiation on fused silica etching selectivity

Materials Research Society Symposium Proceedings

Volumn 850, Issue , 2005, Pages 155-160

  Bellouard, Yves ^a   Said, All A ^b   Dugan, Mark ^b   Bado, Philippe ^b  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b TRANSLUME INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); ETCHING; LASER BEAM EFFECTS; MICROCRACKS; REFRACTION; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; STRUCTURE (COMPOSITION);

FEMTOSECONDS; FUSED SILICA ETCHING SELECTIVITY; LASER BEAM SHAPES; UNEXPOSED REGIONS;

FUSED SILICA;

EID: 23844435957     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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