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Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 945-948

Simulation of microscale densification during femtosecond laser processing of dielectric materials

(3) Zhang, X R a Xu, X a Rubenchik, A M b

a PURDUE UNIVERSITY (United States)

b LAWRENCE LIVERMORE NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY CONDITIONS; COMPUTER SIMULATION; DIELECTRIC MATERIALS; ENERGY ABSORPTION; FUSED SILICA; IRRADIATION; OPTICAL DATA STORAGE; OPTICAL GLASS; PARAMETER ESTIMATION; REFRACTIVE INDEX; STRESS ANALYSIS; THERMAL DIFFUSION; THERMOANALYSIS;

FEMTOSECOND LASERS; OPTICAL REFLECTIVITY; PULSE ENERGY; SURFACE REFLECTION;

LASER PULSES;

EID: 4344622054 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-004-2576-3 Document Type: Conference Paper

Times cited : (31)

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