Reducing ultra-shallow boron diffusion using carbon and fluorine co-implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 237, Issue 1-2, 2005, Pages 142-147

  Vanderpool, Aaron ^a   Taylor, Mitch ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Boron; Carbon; Co implant; Diffusion; Fluorine

Indexed keywords

ANNEALING; ARSENIC; CARBON; DIFFUSION; FLUORINE; ION IMPLANTATION; LATTICE CONSTANTS;

ARSENIC IMPLANT; CO-IMPLANT; FLUORINE CLUSTERS; ULTRA-SHALLOW JUNCTIONS (USJ);

BORON;

EID: 23444456513     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.04.089     Document Type: Conference Paper

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