Atomic nanolithography patterning of submicron features: Writing an organic self-assembled monolayer with cold, bright Cs atom beams

Nanotechnology

Volumn 16, Issue 9, 2005, Pages 1536-1541

  O'Dwyer, C ^a,c   Gay, G ^a   De Lesegno, B Viaris ^a,d   Weiner, J ^a   Camposeo, A ^b   Tantussi, F ^b   Fuso, F ^b   Allegrini, M ^b   Arimondo, E ^b  

^a UNIVERSITÉ PAUL SABATIER   (France)

^b UNIVERSITY OF PISA   (Italy)

^c UNIVERSITY COLLEGE CORK   (Ireland)

^d LABORATOIRE AIMÉ COTTON   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALCOHOLS; ATOMIC BEAMS; CESIUM; ETCHING; GOLD; MASKS; NANOTECHNOLOGY; SINGLE CRYSTALS; SPUTTERING;

ATOM FLUX; ATOMIC NANOLITHOGRAPHY PATTERNING; OPTICAL DIFFRACTION LIMIT; OPTICAL MASKS;

SELF ASSEMBLY;

EID: 23444454800     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/9/022     Document Type: Article

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