A laser-cooled atom beam for nanolithography applications

Materials Science and Engineering C

Volumn 23, Issue 1-2, 2003, Pages 217-220

  Camposeo, A ^a   Cervelli, F ^a   Piombini, A ^a   Tantussi, F ^a   Fuso, F ^a   Allegrini, M ^a   Arimondo, E ^a  

^a UNIVERSITY OF PISA   (Italy)

Author keywords

Atom lithography; Laser manipulation; Laser cooling; Nanofabrication

Indexed keywords

CESIUM; LASER BEAMS; LITHOGRAPHY; SPECTROSCOPIC ANALYSIS;

NANOLITHOGRAPHY;

ATOMIC BEAMS;

LASER;

EID: 0037439815     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0928-4931(02)00270-9     Document Type: Article

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