Laser scanning for semiconductor mask pattern generation

Proceedings of the IEEE

Volumn 90, Issue 10, 2002, Pages 1653-1669

  Allen, Paul C ^a,b  

^a IEEE   (United States)

^b APPLIED MATERIALS INC   (United States)

Author keywords

Laser scanning; Lithography; Mask pattern generation

Indexed keywords

ERROR ANALYSIS; IMAGING TECHNIQUES; LASER APPLICATIONS; LASER BEAMS; SCANNING;

ACOUSTO-OPTIC MODULATION (AOM); GAUSSIAN BEAMS; LASER SCANNING; MASK PATTERN GENERATION;

MASKS;

EID: 2342619364     PISSN: 00189219     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPROC.2002.803664     Document Type: Review

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