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note
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In a previous work, we determined the PL yield to be equal to 2.2% (Ref. 26). This was based on a measured EL yield of 0.5% in a device made from a 75-nm-thick film. Later work determined that electrode quenching had a significant influence in these devices (Ref. 27). Electrode quenching is reduced in the devices discussed in this article, where the thickness of the film is 100 nm.
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