Desorption of O2 from SiO2 films during irradiation of SiO2 with MeV/a.m.u. heavy ions

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 219-220, Issue 1-4, 2004, Pages 312-316

  Arnoldbik, W M ^a   Tomozeiu, N ^a,b   Habraken, F H P M ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

^b OCÉ TECHNOLOGIES B V   (Netherlands)

Author keywords

Elastic recoil detection analysis; Electronic sputtering; Oxygen diffusion; Radiation damage; Silicon dioxide thin films

Indexed keywords

DESORPTION; DIFFUSION; HEAVY IONS; ION BEAMS; RADIATION DAMAGE; SILICA; SPUTTERING; STOICHIOMETRY; THIN FILMS;

ELECTRONIC SPUTTERING; OXYGEN DIFFUSION; SILICON DIOXIDE THIN FILMS;

OXYGEN;

EID: 2342531046     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.01.075     Document Type: Conference Paper

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