Emission energy distribution of secondary ions produced through the electronic sputtering process under heavy ion bombardment

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 164, Issue , 2000, Pages 803-808

  Imanishi, Nobutsugu ^a   Ohta, Hideyuki ^a   Ninomiya, Satoshi ^a   Itoh, Akio ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; ELECTRIC CHARGE; HEAVY IONS; SILICA; SILICON; SILVER; SPUTTERING;

ELECTRONIC SPUTTERING; ELECTRONIC STOPPING POWER;

ION BOMBARDMENT;

EID: 0033741798     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)01077-0     Document Type: Article

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