Effects of fluorocarbon gas species on electrical conductivity and chemical structure of deposited polymer in SiO2 etching processes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 2, 2004, Pages 533-538

  Shimmura, T ^a   Soda, S ^a   Samukawa, S ^a   Koyanagi, M ^a   Hane, K ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; DEPOSITION; ELECTRIC CONDUCTANCE; ETCHING; FOURIER TRANSFORMS; FREQUENCIES; POLYMERS; STRUCTURE (COMPOSITION); THERMAL EFFECTS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHARGE ACCUMULATION; FLUOROCARBON GAS; SILICON FILMS; ULTRAHIGH-FREQUENCY;

SILICA;

EID: 2342473910     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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