The effect of capping layer Ta on magnetic behaviour for multilayers Ta/Co/Co3O4/Ta

Solid State Communications

Volumn 135, Issue 11-12, 2005, Pages 725-728

  Wang, Yaxin ^a   Tian, Wei ^a   Wang, Yixing ^a   Sun, Liang ^a   Li, Qi ^b   You, Biao ^a   Hu, An ^a   Zhai, Hongru ^a   Lu, Mu ^a  

^a NANJING UNIVERSITY   (China)

^b SOUTHEAST UNIVERSITY   (China)

Author keywords

A. Multilayers; D. Exchange bias; D. Non magnetic defects; E. XPS

Indexed keywords

DIFFUSION; FERROMAGNETISM; HYSTERESIS; MAGNETIZATION; MAGNETRON SPUTTERING; MULTILAYERS; X RAY PHOTOELECTRON SPECTROSCOPY;

ANTIFERROMAGNETIC (AFM) LAYER; CAPPING LAYER; EXCHANGE BIAS; NON-MAGNETIC DEFECTS;

TANTALUM;

EID: 23344450942     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2005.06.004     Document Type: Article

References (10)

1. P.J. van der Zag, A.R. Ball, L.F. Feiner, R.M. Wolf, and P.A.A. van der Heijden J. Appl. Phys. 79 1996 5103
2. K.C. Hall, W.H. Lau, K. Gündoǧdu, M.E. Flatté, and T.F. Boggess Appl. Phys. Lett. 83 2003 2937
3. S. Gangopadhyay, G.C. Hadjipanayis, C.M. Sorensen, and J. Klabunde J. Appl. Phys. 73 1993 6964
4. B. You, Y.iX. Wang, Y.L. Zhao, L. Sun, W.T. Sheng, M.H. Pan, J. Du, A. Hu, and M. Lu J. Appl. Phys. 93 2003 6587
5. T. Ambrose, and C.L. Chien Phys. Rev. Lett. 76 1996 1743
6. T. Ambrose, and C.L. Chien J. Appl. Phys. 83 1998 6822
7. J. Haber, and L. Ungier J. Electron. Spectrosc. Relat. Phenom. 12 1977 305
8. J. Esser, U. Nowak, and K.D. Usadel Phys. Rev. B 55 1997 5866
9. W. Kleemann Int. J. Mod. Phys. B 7 1993 2469
10. C.H. Lai, W.E. Bailey, and R.L. White J. Appl. Phys. 81 1997 4990