In-plane orientation and annealing behavior of rutile TiO2 films on MgO substrate prepared by inductively coupled plasma-assisted sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 5 A, 2005, Pages 3192-3195

  Okimura, Kunio ^a   Furumi, Takahiro ^a  

^a TOKAI UNIVERSITY   (Japan)

Author keywords

Annealing behavior; In plane orientation; Inductively coupled plasma assisted sputtering; MgO substrate; Rutile TiO2

Indexed keywords

ANNEALING; CRYSTAL ORIENTATION; INDUCTIVELY COUPLED PLASMA; MAGNESIA; SPUTTERING; SYNTHESIS (CHEMICAL); THIN FILMS; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET SPECTROMETERS; X RAY PHOTOELECTRON SPECTROSCOPY;

ANNEALING BEHAVIOR; IN-PLANE ORIENTATION; INDUCTIVELY COUPLED PLASMA ASSISTED-SPUTTERING; MGO SUBSTRATE; RUTILE TIO2;

SINGLE CRYSTALS;

EID: 22544474174     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.3192     Document Type: Article

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