Structure and electrical properties of MgTiO3 thin films deposited by rf magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 6, 2004, Pages 2440-2445

  Huang, Cheng Liang ^a   Pan, Chung Long ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CERAMIC MATERIALS; ELECTRONIC STRUCTURE; MAGNESIUM COMPOUNDS; MAGNETRON SPUTTERING; MICROSTRUCTURE; MICROWAVE CIRCUITS; MOS CAPACITORS; NATURAL FREQUENCIES; SCANNING ELECTRON MICROSCOPY; SINTERING; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION ANALYSIS;

DISSIPATION FACTOR; POLYCRYSTALLINE MICROSTRUCTURE; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 10244221093     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1810164     Document Type: Article

References (17)

1. S. Nishigaki, H. Kalo, S. Yano, and R. Kamimure, Am. Ceram. Soc. Bull. 66, 1405 (1987).
2. K. Wakino, K. Minai, and H. Tamura, J. Am. Ceram. Soc. 67, 278 (1984).
3. T. Takada, S. F. Wang, S. Yoshikawa, S. J. Yang, and R. E. Newnham, J. Am. Ceram. Soc. 77, 1909 (1994).
4. R. J. Cava, W. F. Peck Jr., J. J. Krajewski, G. L. Reberts, and B. P. Barber, Appl. Phys. Lett. 70, 1396 (1997).
5. G. C. Ling, R. S. Withers, B. F. Cole, and N. Newman, IEEE Trans. Microwave Theory Tech. 42, 34 (1994).
6. D. E. Oates and A. C. Anderson, IEEE Trans. Magn. 28, 867 (1991).
7. Ceramic Engineering Handbook (Ceramic Society of Japan, Gihodo, Tokyo, 1989), p. 1885.
8. K. Wakino, Ferroelectrics 91, 69 (1989).
9. V. M. Ferreir and J. L. Baptista, J. Mater. Res. 12, 3293 (1997).
10. V. M. Ferreir, F. Azough, I. L. Baptista, and R. Freer, Ferroelectrics 133, 127 (1992).
11. S. B. Desu and H. M. O'Bryan, J. Am. Ceram. Soc. 68, 546 (1985).
12. D. A. Sagada and S. Nambu, J. Am. Ceram. Soc. 75, 2573 (1992).
13. Y. Syono, S. Akimoro, Y. Ishikawa, and Y. Endoh, J. Phys. Chem. Solids 30, 1665 (1969).
14. J. Zng, H. Wang, S. Song, Q. Zhang, J. Cheng, S. Shang, and M. Wang, J. Cryst. Growth 178, 355 (1997).
15. J. Lee and C. W. Choi, Jpn. J. Appl. Phys., Part 1 38, 3651 (1999).
16. C. W. Choi, Y. U. Kwon, and J. Lee, J. Korean Phys. Soc. 32, 1417 (1998).
17. P. Bhattacharya, T. Komeda, K. Park, and Y. Nishioika, Jpn. J. Appl. Phys., Part 1 32, 4103 (1993).