Field emission from hydrogenated amorphous carbon nanotips grown on Cu/Ti/Si(100)

Journal of the Electrochemical Society

Volumn 152, Issue 6, 2005, Pages

  Wei, C H ^a   Chen, C H ^a   Yeh, C M ^a   Chen, M Y ^a   Hwang, J ^a   Lee, A P ^a   Kou, C S ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; COPPER COMPOUNDS; CRYSTAL GROWTH; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMISTRY; HYDROGENATION; MICROWAVES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY;

AMORPHOUS CARBON NANOTIPS; ETCHING PROCESS; FIELD EMISSION; GROWTH MECHANISM;

NANOSTRUCTURED MATERIALS;

EID: 22544434953     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1899264     Document Type: Conference Paper

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