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Journal of Applied Physics

Volumn 91, Issue 6, 2002, Pages 3918-3921

Electron field emission from diamond-like carbon films and a patterned array by using a Ti interfacial layer

(4) Mao, D S a Liu, X H a Wang, X a Zhu, W b

a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY (China)

b LUCENT TECHNOLOGIES (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELD ENHANCEMENT; ELECTRON FIELD EMISSION; EMISSION CURRENT DENSITY; EMISSION ENHANCEMENT; EMISSION MECHANISM; ENHANCING EFFECT; FILTERED ARC DEPOSITION; INTERFACIAL LAYER; PATTERNED ARRAYS; POTENTIAL BARRIERS; REACTIVE ION BEAM ETCHING; SITE DENSITY; THRESHOLD FIELDS; TRIPLE JUNCTION;

CARBON FILMS; DIAMONDS; ELECTRIC FIELDS; ETCHING; FIELD EMISSION; ION BEAMS;

DIAMOND LIKE CARBON FILMS;

EID: 0037087357 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1448405 Document Type: Article

Times cited : (22)

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