Scattering in Liquid Immersion Lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 1, 2004, Pages 469-476

  Switkes, M ^a   Bloomstein, T M ^a   Kunz, R R ^a   Rothschild, M ^a   Ruberti, J W ^b   Shedd, T A ^c   Yeung, M ^d  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b Polymer Group Inc   (United States)

^c University of Wisconsin Madison   (United States)

^d BOSTON UNIVERSITY   (United States)

Author keywords

Bubbles; Immersion liquid; Immersion lithography; Resist outgassing; Scattering; Water

Indexed keywords

IMMERSION LIQUIDS; IMMERSION LITHOGRAPHY; MOLECULAR DIPOLES; RESIST OUTGASSING;

APPROXIMATION THEORY; BUBBLES (IN FLUIDS); DEGASSING; HYDROPHOBICITY; LIGHT REFRACTION; LIGHT SCATTERING; NITROGEN; PERMITTIVITY; RAYLEIGH SCATTERING; WATER;

LITHOGRAPHY;

EID: 3843112147     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534194     Document Type: Conference Paper

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