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Volumn 31, Issue 1, 2005, Pages 63-69
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Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTROMAGNETIC WAVE DIFFRACTION;
IMAGING SYSTEMS;
INTEGRATED CIRCUITS;
LITHOGRAPHY;
MASKS;
MEASUREMENT THEORY;
PATTERN RECOGNITION;
POLARIMETERS;
PROCESS CONTROL;
CRITICAL DIMENSION (CD);
DIFFRACTION AND SCATTERING;
MUELLER POLARIMETRY;
PATTERN TRANSFER;
MICROELECTRONICS;
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EID: 22144469417
PISSN: 12860042
EISSN: None
Source Type: Journal
DOI: 10.1051/epjap:2005034 Document Type: Article |
Times cited : (31)
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References (23)
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