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Volumn 31, Issue 1, 2005, Pages 63-69

Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; IMAGING SYSTEMS; INTEGRATED CIRCUITS; LITHOGRAPHY; MASKS; MEASUREMENT THEORY; PATTERN RECOGNITION; POLARIMETERS; PROCESS CONTROL;

EID: 22144469417     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:2005034     Document Type: Article
Times cited : (31)

References (23)
  • 4
    • 0036029659 scopus 로고    scopus 로고
    • Q. Wu et al., Proc. SPIE 4689, 364 (2002)
    • (2002) Proc. SPIE , vol.4689 , pp. 364
    • Wu, Q.1
  • 5
    • 0033690048 scopus 로고    scopus 로고
    • X. Yin et al., Proc. SPIE 3998, 449 (2000)
    • (2000) Proc. SPIE , vol.3998 , pp. 449
    • Yin, X.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.