Ultra-fast wafer alignment simulation based on thin film theory

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4689 I, Issue , 2002, Pages 364-373

  Wu, Qiang ^a,b   Williams, Gary ^a   Kim, Byeong ^a   Strane, Jay ^a   Wiltshire, Timothy ^a   Lehner, Eric ^a   Akatsu, Hiroyuki ^a  

^a IBM MICROELECTRONICS   (United States)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Alignment simulation; Diffraction detection; Direct imaging; Thin film theory

Indexed keywords

ALIGNMENT; COMPUTER SIMULATION; COSTS; DIFFRACTION; DYNAMIC RANDOM ACCESS STORAGE; FABRICATION; IMAGING TECHNIQUES; MASKS; OPTICAL RESOLVING POWER;

TOPOGRAPHY; ULTRA-FAST WAFER ALIGNMENT SIMULATION;

SEMICONDUCTING FILMS;

EID: 0036029659     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473475     Document Type: Article

References (5)

1. Xiaomin Yin, Alfred Wong, Don Wheeler, Gary Williams, Eric Lehner, Franz Zach, Byeong Kim, Yuzo Fukuzaki, Z. George Lu, Santo Credendino, and Tim Wiltshire, "Sub-wavelength Alignment mark Signal Analysis of Advanced Memory Products", Proc. SPIE 3998, 449 (2000) and references therein.
2. F. Bornebroek, J. Burghoorn, J.S. Greeneich, H.J. Megens, D. Satriasaputra, G. Simons, S. Stalnaker, B. Koek, "Overlay Performance in Advanced Processes", Proc. of SPIE 4000, 520 (2000).
3. A. Wong and A.R. Neureuther, "Rigorous Three-Dimensional Time-Domain Finite-Difference Electromagnetic Simulation for Photolithographic Applications", IEEE Trans. Semiconductor Manufacturing, 8, 419 (1995).
4. Qiang Wu, Z. George Lu, Gary Williams, Franz Zach, Bernhard Liegl, "Optimization of Segmented Alignment Marks for Advanced Semiconductor Fabrication Processes", Proc. of SPIE 4344, 234 (2001).
5. O.S. Heavens, "Optical Properties of Thin Solid films", Dover Publications, New York (1991).