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Journal of Crystal Growth

Volumn 281, Issue 2-4, 2005, Pages 318-322

A study of the correlation between nickel and the ultraviolet emission in SiOx films

(3) He, Y a Feng, J Y a Wu, Q L a

a TSINGHUA UNIVERSITY (China)

Author keywords

A1. Doping; A3. Physical vapor deposition process; B1. Nanomaterials; B2. Nonlinear optic materials

Indexed keywords

ANNEALING; DOPING (ADDITIVES); ENERGY DISPERSIVE SPECTROSCOPY; NANOSTRUCTURED MATERIALS; NICKEL; NONLINEAR OPTICS; OPTICAL MATERIALS; OXYGEN; PHYSICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; ULTRAVIOLET RADIATION;

NANOMATERIALS; NONLINEAR OPTIC MATERIALS; OXYGEN EXCESS DEFECTS; PHYSICAL VAPOR DEPOSITION PROCESSES;

THIN FILMS;

EID: 22144444602 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2005.04.059 Document Type: Article

Times cited : (5)

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