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Volumn , Issue , 2000, Pages 64-71

Under bump metallisation of fine pitch flip-chip using electroless nickel deposition

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CHEMICAL ACTIVATION; DEPOSITION; ELECTRONICS PACKAGING; FLIP CHIP DEVICES; MODIFIED ATMOSPHERE PACKAGING; NICKEL; SOLDERING;

EID: 21644478739     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/EMAP.2000.904134     Document Type: Conference Paper
Times cited : (3)

References (14)
  • 3
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    • Development of a cost effective and flexible bumping method for flip-chip interconnections
    • Liu, J., "Development of a Cost Effective and Flexible Bumping Method for Flip-chip Interconnections", Hybrid Circuits 29 (1992) 25
    • (1992) Hybrid Circuits , vol.29 , pp. 25
    • Liu, J.1
  • 7
    • 0033323153 scopus 로고    scopus 로고
    • Evaluation of eutectic solder bump interconnect technology
    • Austin, TX, October
    • Beddingfield, C, Q. Tan and A. Mistry, "Evaluation of Eutectic Solder Bump Interconnect Technology", Proc. 24th IEMT Symposium, Austin, TX, October 1999, pp 131.
    • (1999) th IEMT Symposium , pp. 131
    • Beddingfield, C.1    Tan, Q.2    Mistry, A.3
  • 9
    • 0026169556 scopus 로고
    • Pretreatments to improve the adhesion of electrodeposits on aluminium
    • Monteiro, F.J., M.A. Barbosa, D.H. Ross and D.R. Gabe, "Pretreatments to Improve the Adhesion of Electrodeposits on Aluminium", Surf. Interface Anal., 17(1991)519.
    • (1991) Surf. Interface Anal , vol.17 , pp. 519
    • Monteiro, F.J.1    Barbosa, M.A.2    Ross, D.H.3    Gabe, D.R.4
  • 10
    • 0031144264 scopus 로고    scopus 로고
    • Improvements in the pretreatment of aluminium as a substrate for electrodeposition
    • Pearson, T., and S.J. Wake, "Improvements in the Pretreatment of Aluminium as a Substrate for electrodeposition", Trans. Inst. Met. Fin., 75(1997)93.
    • (1997) Trans. Inst. Met. Fin , vol.75 , pp. 93
    • Pearson, T.1    Wake, S.J.2
  • 12
    • 0031121497 scopus 로고    scopus 로고
    • Ni electroless plating process for solder bump chip on glass technology
    • Han, J.I., S.J. Hong, "Ni Electroless Plating Process for Solder Bump Chip on Glass Technology", Jpn. J. Appl. Phys., 36(1997)2091.
    • (1997) Jpn. J. Appl. Phys , vol.36 , pp. 2091
    • Han, J.I.1    Hong, S.J.2
  • 13
    • 0031186473 scopus 로고    scopus 로고
    • The role of iron(III) and tartrate in the zincate immersion process for plating aluminium
    • Robertson, S.G., I.M. Ritchie, "The Role of Iron(III) and Tartrate in the Zincate Immersion Process for Plating Aluminium", J. Appl. Electrochem. 27 (1997) 799.
    • (1997) J. Appl. Electrochem , vol.27 , pp. 799
    • Robertson, S.G.1    Ritchie, I.M.2
  • 14
    • 0031375291 scopus 로고    scopus 로고
    • Preparation of solder bumps incorporating electroless nickel-boron deposit and investigation on the interfacial interaction behaviour and wetting kinetics
    • Lee, C.Y., K.L. Lin, "Preparation of Solder Bumps Incorporating Electroless Nickel-Boron Deposit and Investigation on the Interfacial Interaction Behaviour and Wetting Kinetics", J. Mat. Sci: Mat. In Electronics 8(1997) 377
    • (1997) J. Mat. Sci: Mat Electronics , vol.8 , pp. 377
    • Lee, C.Y.1    Lin, K.L.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.