Design, fabrication, and characterization of a full complex-amplitude modulation diffractive optical element

Journal of Microlithography, Microfabrication and Microsystems

Volumn 2, Issue 2, 2003, Pages 96-104

  Neto, Luiz Gonçalves ^a   Cardona, Patricia Soares Pinto ^a   Cirino, Giuseppe Antonio ^a   Mansano, Ronaldo Domingues ^a   Verdonck, Patrick ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

Computers generated holograms; Diamond like carbon based DOEs; Diffractive optical elements (DOEs); Full complex amplitude modulation

Indexed keywords

EID: 2142832785     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1562930     Document Type: Article

References (27)

1. J. W. Goodman, Introduction to Fourier Optics, 2nd ed., pp. 173-184, McGraw-Hill Book Co., New York, NY (1996).
2. Donald C. O'Shea, Elements of Modern Optical Design, pp. 342-345, John Wiley & Sons, Inc., Hoboken, NJ (1985).
3. J. W. Goodman, Introduction to Fourier Optics, 2nd ed., pp. 96-101, McGraw-Hill Book Co., New York, NY (1996).
4. E. Hecht, Optics, 2nd ed., pp. 128-148, 163-169, Addison-Wesley Publishing Company, Inc., Boston, MA (1990).
5. J. W. Goodman, Introduction to Fourier Optics, 2nd ed., pp. 351-361, McGraw-Hill Book Co., New York, NY (1996).
6. J. Turunen and F. Wyrowski, Eds., Diffractive Optics for Industrial and Commercial Applications, Akademie Verlag, Berlin, Germany (1997).
7. F. Wyrowski, "Diffraction efficiency of analog and quantized digital amplitude holograms: analysis and manipulation," J. Opt. Soc. Am. A 7(3), 383-393 (1990).
8. A. W. Lohmann and D. P. Paris, "Binary Fraunhofer holograms generated by computer," Appl. Opt. 6, 1739-1748 (1967).
9. J. W. Brown and A. W. Lohmann, "Computer-generated binary holograms," IBM J. Res. Dev. 14, 160-168 (1970).
10. D. C. Chu, J. R. Fienup, and J. W. Goodman, "Multiemulsion on-axis computer-generated hologram," Appl. Opt. 12, 1386-1388 (1973).
11. V. Kettunem, P. Vahimaa, J. Turunen, and E. Noponem, "Zeroth-order coding of complex amplitude in two dimensions," J. Opt. Soc. Am. A 14, 808-815 (1997).
12. E. Noponem and J. Turunen, "Complex-amplitude modulation by high-carrier-frequency diffractive elements," J. Opt. Soc. Am. A 13, 1422-1428 (1996).
13. F. Wyrowski, E. Kley, T. J. Nellissen, L. Wang, and S. Bühling, "Proximity printing by wave-optically designed masks," Proc. SPIE 4436, 130-139 (2001).
14. S. C. Tucker, W. T. Cathey, and E. R. Dowski, "Extended depth of field and aberration control for inexpensive digital microscope systems," Opt. Express 4, 467-474 (1999).
15. E. R. Dowski Jr. and W. T. Cathey, "Extended depth of field through wave-front coding," Appl. Opt. 34, 1859-1866 (1995).
16. R. W. Gerchberg and W. 0. Saxton, "A practical algorithm for the determination of phase from image and diffraction plane pictures," Optik (Stuttgart) 35, 237-246 (1972).
17. J. R. Fienup, "Iterative method applied to image reconstruction and computer-generated holograms," Opt. Eng. 19, 297-305 (1980).
18. J. W. Goodman, Introduction to Fourier Optics, 2nd ed., pp. 59-61, McGraw-Hill Book Co., New York, NY (1996).
19. S. Wolf and R. N. Tauber Silicon Processing for VLSI Era, Vol.1, pp. 374-381, Lattice Press, Sunset Beach, CA (1986).
20. V. Hoffman, "Practical troubleshooting of vacuum deposition processes and equipment for aluminum metallization," Solid. State Technol. 21(12), 47-56 (1978).
21. S. A. Campbell, The Science and Engineering of Microelectronics Fabrication, pp. 269-272, Oxford University Press, Oxford (1996).
22. M. Madou, Fundamentals of Microfabrication, CRC Press, Boca Raton, FL (1997).
23. 6-based reactive ion etching processes for micromachining applications," J. Solid State Devices and Circuits, 6(1), 1-6 (1998).
24. 3 plasmas," Vacuum 55, 191-196 (1999).
25. R. D. Mansano, M. Massi, L. S. Zambon, P. Verdonck, P. M. Nogueira, H. S. Maciel, and C. Otani, "Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering," Thin Solid Films 373, 243-246 (2000).
26. M. Hwang and C. Lee, "Effects of oxygen and nitrogen addition on the optical properties of diamond-like carbon films," Mater. Sci. Eng., B 75, 24-28 (2000).
27. R. D. Mansano, P. Verdonk, and H. S. Maciel, "Anisotropic reactive ion etching in silicon, using a graphite electrode," Sens. Actuators A 65, 180-186 (1998).