Proximity printing by wave-optically designed masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4436, Issue , 2001, Pages 130-139

  Wyrowski, Frank ^a   Kley, Ernst Bernhard ^a   Bühling, Sven ^b   Nellissen, A J M ^c   Wang, Lingli ^c   Dirkzwager, Maarten ^c  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b LightTrans GmbH   (Germany)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

LCD; Optical engineering; Proximity printing; Wave optical design

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; LIQUID CRYSTAL DISPLAYS; OPTICAL DESIGN; PHASE MODULATION;

PROXIMITY PRINTING;

MASKS;

EID: 0035759535     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.451293     Document Type: Article

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