Effects of applying stress on the electron field emission properties in amorphous carbon thin films

Applied Physics Letters

Volumn 86, Issue 23, 2005, Pages 1-3

  Poa, C H P ^a   Silva, S R P ^a   Lacerda, R G ^b   Amaratunga, G A J ^b   Milne, W I ^b   Marques, F C ^c  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; CARRIER CONCENTRATION; CHEMICAL BONDS; ELECTRIC FIELDS; ELECTRON EMISSION; ION BEAM ASSISTED DEPOSITION; SENSORS; STRESS ANALYSIS; THIN FILMS;

BOND HYBRIDIZATION; BOND STABILITY; ELECTRIC FIELD EMISSION; STRESS SENSORS;

DIAMOND LIKE CARBON FILMS;

EID: 21244491198     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1940129     Document Type: Article

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