A Comparative Evaluation of Mask Cleaning Performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 510-517

  Jeong, Woo Gun ^a   Park, Dong Il ^a   Park, Eui Sang ^a   Cho, Young Woong ^a   Choi, Se Jong ^a   Kwon, Hyuk Joo ^a   Kim, Jin Min ^a   Choi, Sang Soo ^a  

^a Photomask R and D Center   (South Korea)

Author keywords

Conventional wet cleaning; UV Ozone treatment; Wettability

Indexed keywords

CLEANING; GLASS; LITHOGRAPHY; OPTICAL PROPERTIES; OPTIMIZATION; OZONE; PHASE SHIFT; ULTRAVIOLET RADIATION;

CONVENTIONAL WET CLEANING; MASK CLEANING;

MASKS;

EID: 1842579655     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)

1. Hitoshi Handa, Masumi Takahashi, and Hisatsugu Shirai, "Study of reticle cleaning process for 130 nm lithography and beyond", Digest of papers PMJ P147(2001)
2. Zoram Falkenstein, "Surface cleaning mechanism utilizing VUV radiation in oxygen containing gaseous environments",
3. Werner Kern, "Handbook of semiconductor wafer cleaning technology" P18