SCOPUS 정보 검색 플랫폼

Volumn 97, Issue 10, 2005, Pages

Morphological switching in synchrotron-radiation-excited Ge homoepitaxy: Transition from kinetic roughening to smoothing

(1) Akazawa, Housei a

a NTT CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN ATOMS; KINETIC ROUGHENING; LATTICE MISMATCH; SURFACE FREE ENERGY;

EPITAXIAL GROWTH; FREE ENERGY; GERMANIUM; IRRADIATION; MOLECULAR BEAM EPITAXY; MORPHOLOGY; PASSIVATION; PHASE TRANSITIONS; REACTION KINETICS; SURFACE ROUGHNESS; TEMPERATURE DISTRIBUTION;

SYNCHROTRON RADIATION;

EID: 21044440615 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1900295 Document Type: Article

Times cited : (5)

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