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Applied Surface Science

Volumn 106, Issue , 1996, Pages 211-222

Photoepitaxy of Si and Ge by synchrotron radiation

(1) Akazawa, Housei a

a LSI Laboratories (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMISORPTION; CRYSTAL STRUCTURE; HYDRIDES; PHOTOCHEMICAL REACTIONS; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SURFACE ACTIVE AGENTS; SYNCHROTRON RADIATION;

PHOTON STIMULATED HYDROGEN DESORPTION;

EPITAXIAL GROWTH;

EID: 0030566091 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(96)00403-5 Document Type: Article

Times cited : (15)

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