Approaching the low-temperature limit in nucleation and two-dimensional growth of fcc (100) metal films Ag/Ag(100)

Physical Review B - Condensed Matter and Materials Physics

Volumn 66, Issue 15, 2002, Pages 1554351-1554357

  Frank, S ^a   Wedler, H ^a,d   Behm, R J ^a   Rottler, J ^b,e   Maass, P ^b   Caspersen, K J ^c,f   Stoldt, C R ^c,g   Thiel, P A ^c   Evans, J W ^c  

^a UNIVERSITY OF ULM   (Germany)

^b UNIVERSITY OF KONSTANZ   (Germany)

^c IOWA STATE UNIVERSITY   (United States)

^d DAIMLER AG   (Germany)

^e JOHNS HOPKINS UNIVERSITY   (United States)

^f UNIVERSITY OF CALIFORNIA   (United States)

^g UCB 450   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

METAL; SILVER;

ARTICLE; CHEMICAL ANALYSIS; DIFFUSION; DYNAMICS; LOW TEMPERATURE; MATERIALS; MATERIALS TESTING; MONTE CARLO METHOD; PHYSICS; SCANNING TUNNELING MICROSCOPY;

EID: 20744449170     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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