-
1
-
-
3943066406
-
"N-type Schottky barrier source/drain MOSFET using ytterbium silicide"
-
Aug
-
S. Zhu, J. Chen, M.-F. Li, S. J. Lee, J. Singh, C. X. Zhu, A. Du, C. H. Tung, A. Chin, and D. L. Kwong, "N-type Schottky barrier source/ drain MOSFET using ytterbium silicide," IEEE Electron Device Lett., vol. 25, no. 8, pp. 565-567, Aug. 2004.
-
(2004)
IEEE Electron Device Lett.
, vol.25
, Issue.8
, pp. 565-567
-
-
Zhu, S.1
Chen, J.2
Li, M.-F.3
Lee, S.J.4
Singh, J.5
Zhu, C.X.6
Du, A.7
Tung, C.H.8
Chin, A.9
Kwong, D.L.10
-
2
-
-
1242264268
-
"A 50-nm-gate-length erbium-silicided n-type Schottky barrier metal-oxide-semiconductor field-effect transistor"
-
Feb
-
M. Jang, Y. Kim, J. Shin, and S. Lee, "A 50-nm-gate-length erbium-silicided n-type Schottky barrier metal-oxide-semiconductor field-effect transistor," Appl. Phys. Lett., vol. 84, pp. 741-743, Feb. 2004.
-
(2004)
Appl. Phys. Lett.
, vol.84
, pp. 741-743
-
-
Jang, M.1
Kim, Y.2
Shin, J.3
Lee, S.4
-
3
-
-
0034453418
-
"Complementary silicide source/drain thin-body MOSFETs for the 20 nm gate length regime"
-
J. Kedzierski, P. Xuan, E. K. Erik, H. Anderson, J. Bokor, T.-J. King, and C. Hu, "Complementary silicide source/drain thin-body MOSFETs for the 20 nm gate length regime," in IEDM Tech. Dig., 2000, pp. 57-60.
-
(2000)
IEDM Tech. Dig.
, pp. 57-60
-
-
Kedzierski, J.1
Xuan, P.2
Erik, E.K.3
Anderson, H.4
Bokor, J.5
King, T.-J.6
Hu, C.7
-
4
-
-
3342986527
-
"Electron transport at metal-semiconductor interfaces: General theory"
-
Jun
-
R. T. Tung, "Electron transport at metal-semiconductor interfaces: general theory," Phys. Rev. B, Condens. Matter, vol. 45, pp. 13509-13 523, Jun. 1992.
-
(1992)
Phys. Rev. B, Condens. Matter
, vol.45
, pp. 13509-13523
-
-
Tung, R.T.1
-
5
-
-
0030190821
-
"Current-voltage characteristics of Schottky barrier diodes with dynamic interfacial defect state occupancy"
-
Jul
-
R. B. Darling, "Current-voltage characteristics of Schottky barrier diodes with dynamic interfacial defect state occupancy," IEEE Trans. Electron. Devices, vol. 43, no. 7, pp. 1153-1160, Jul. 1996.
-
(1996)
IEEE Trans. Electron. Devices
, vol.43
, Issue.7
, pp. 1153-1160
-
-
Darling, R.B.1
-
7
-
-
0033885394
-
"Characterization of shallow silicided junctions for sub-quarter micron ULSI technology - Extraction of silicidation induced Schottky contact area"
-
Apr
-
H. D. Lee, "Characterization of shallow silicided junctions for sub-quarter micron ULSI technology - extraction of silicidation induced Schottky contact area," IEEE Trans. Electron Devices, vol. 47, no. 4, pp. 762-767, Apr. 2000.
-
(2000)
IEEE Trans. Electron Devices
, vol.47
, Issue.4
, pp. 762-767
-
-
Lee, H.D.1
-
8
-
-
0033283712
-
"Analysis of transition region and accumulation layer effect in the subthreshold slope in SOI nMOSFETs and their influences on the interface trap density extraction"
-
V. Sonnenberg and J. A. Martino, "Analysis of transition region and accumulation layer effect in the subthreshold slope in SOI nMOSFETs and their influences on the interface trap density extraction," Solid State Electron., vol. 43, pp. 2191-2199, 1999.
-
(1999)
Solid State Electron.
, vol.43
, pp. 2191-2199
-
-
Sonnenberg, V.1
Martino, J.A.2
-
9
-
-
0000780737
-
"Flat-band conditions observed for lanthanide-silicide monolayers on n-type Si(111)"
-
Mar
-
S. Vandre, T. Kalka, C. Preinesberger, and M. Dahne-Prietsch, "Flat-band conditions observed for lanthanide-silicide monolayers on n-type Si(111)," Phys. Rev. Lett., vol. 82, no. 3, pp. 1927-1930, Mar. 1999.
-
(1999)
Phys. Rev. Lett.
, vol.82
, Issue.3
, pp. 1927-1930
-
-
Vandre, S.1
Kalka, T.2
Preinesberger, C.3
Dahne-Prietsch, M.4
-
10
-
-
20544454947
-
"Experimental evidence of gate-induced Schottky barrier height lowering due to image force in gated Schottky diodes"
-
A. Kinoshita, K. Uchida, and J. Koga, "Experimental evidence of gate-induced Schottky barrier height lowering due to image force in gated Schottky diodes," Solid-State Device Meeting, pp. 710-711, 2003.
-
(2003)
Solid-State Device Meeting
, pp. 710-711
-
-
Kinoshita, A.1
Uchida, K.2
Koga, J.3
|