Characterization of silver CPWs for applications in silicon MMICs

IEEE Electron Device Letters

Volumn 26, Issue 6, 2005, Pages 357-359

  Levenets, V V ^a   Amaya, R E ^a   Tarr, N G ^a   Smy, T J ^a   Rogers, J W M ^a  

^a CARLETON UNIVERSITY   (Canada)

Author keywords

Conductivity; Coplanar waveguides (CPWs); Copper; High frequency measurements; Losses; Microwave technology; Monolithic microwave integrated circuits (MMICs); Semiconductor device fabrication; Silicon; Silver; Transmission lines

Indexed keywords

AGGLOMERATION; COPPER; CURRENT DENSITY; ELECTRIC CONDUCTIVITY; ELECTRIC LINES; ELECTROMIGRATION; METALLIZING; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SILVER; SPURIOUS SIGNAL NOISE; WAVEGUIDES;

ELECTROCHEMICAL MIGRATION; HIGH FREQUENCY MEASUREMENTS;

MONOLITHIC MICROWAVE INTEGRATED CIRCUITS;

EID: 20544441283     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2005.848120     Document Type: Article

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