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Journal of Crystal Growth

Volumn 280, Issue 3-4, 2005, Pages 352-356

Properties of Si-rich SiO2 films by RF magnetron sputtering

(4) He, Y a Bi, L a Feng, J Y a Wu, Q L a

a TSINGHUA UNIVERSITY (China)

Author keywords

A1. Low dimensional structures; A3. Physical vapor deposition process; B1. Nanomaterials; B2. Semiconducting materials

Indexed keywords

AMORPHOUS MATERIALS; LIGHT EMITTING DIODES; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; PHYSICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

LOW-DIMENSIONAL STRUCTURES; NANOMATERIALS; PHYSICAL VAPOR DEPOSITION PROCESS; SEMICONDUCTING MATERIALS;

SILICA;

EID: 20344403550 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2005.03.081 Document Type: Article

Times cited : (17)

References (15)

1
- 0141775174
- L.T. Canham Appl. Phys. Lett. 57 1990 1046
- (1990) Appl. Phys. Lett. , vol.57 , pp. 1046
- Canham, L.T.¹

2
- 20344397855
- S.S. Iyer, and Y.-H. Xie Science 40 1993 260
- (1993) Science , vol.40 , pp. 260
- Iyer, S.S.¹ Xie, Y.-H.²

3
- 0002246344
- G. Frannò, A. Irrera, E.C. Moreira, M. Miritello, F. Iacona, D. Sanfilippo, G. Di Stefano, and F. Priolo Appl. Phys. A 74 2002 1
- (2002) Appl. Phys. a , vol.74 , pp. 1
- Frannò, G.¹ Irrera, A.² Moreira, E.C.³ Miritello, M.⁴ Iacona, F.⁵ Sanfilippo, D.⁶ Di Stefano, G.⁷ Priolo, F.⁸

4
- 35949006582
- Y. Kanemitsu, T. Ogawa, K. Shiraishi, and K. Takeda Phys. Rev. B 48 1993 4883
- (1993) Phys. Rev. B , vol.48 , pp. 4883
- Kanemitsu, Y.¹ Ogawa, T.² Shiraishi, K.³ Takeda, K.⁴

5
- 0032157520
- H. Seifarth, R. Grötzschel, A. Markwitz, W. Matz, P. Nitzsche, and L. Rebohle Thin Solid Films 330 1998 202
- (1998) Thin Solid Films , vol.330 , pp. 202
- Seifarth, H.¹ Grötzschel, R.² Markwitz, A.³ Matz, W.⁴ Nitzsche, P.⁵ Rebohle, L.⁶

6
- 0037429816
- C. Garcia, B. Garrido, P. Pellegrino, R. Ferre, J.A. Moreno, J.R. Morante, L. Pavesi, and M. Cazzanelli Appl. Phys. Lett. 82 2003 1595
- (2003) Appl. Phys. Lett. , vol.82 , pp. 1595
- Garcia, C.¹ Garrido, B.² Pellegrino, P.³ Ferre, R.⁴ Moreno, J.A.⁵ Morante, J.R.⁶ Pavesi, L.⁷ Cazzanelli, M.⁸

7
- 0031997827
- Inokuma, Y. Wakayama, T. Muramoto, R. Aoki, Y. Kurata, and S. Hasegawa J. Appl. Phys. 83 1998 2228
- (1998) J. Appl. Phys. , vol.83 , pp. 2228
- Inokuma¹ Wakayama, Y.² Muramoto, T.³ Aoki, R.⁴ Kurata, Y.⁵ Hasegawa, S.⁶

8
- 0347683994
- S. Charvet, R. Madelon, F. Gourbilleau, and R. Rizk J. Lumin. 80 1999 257
- (1999) J. Lumin. , vol.80 , pp. 257
- Charvet, S.¹ Madelon, R.² Gourbilleau, F.³ Rizk, R.⁴

9
- 2942547875
- C. Bonafos, M. Carrada, N. Cherkashin, H. Coffin, D. Chassaing, G. Ben Assayag, A. Claverie, T. Müller, K.H. Heinig, M. Perego, M. Fanciulli, P. Dimitrakis, and P. Normand J. Appl. Phys. 95 2004 5696
- (2004) J. Appl. Phys. , vol.95 , pp. 5696
- Bonafos, C.¹ Carrada, M.² Cherkashin, N.³ Coffin, H.⁴ Chassaing, D.⁵ Ben Assayag, G.⁶ Claverie, A.⁷ Müller, T.⁸ Heinig, K.H.⁹ Perego, M.¹⁰ Fanciulli, M.¹¹ Dimitrakis, P.¹² Normand, P.¹³

10
- 1042277501
- A. Meldrum, K.S. Buchanan, A. Hryciw, and W. White Adv. Mater. 16 2004 31
- (2004) Adv. Mater. , vol.16 , pp. 31
- Meldrum, A.¹ Buchanan, K.S.² Hryciw, A.³ White, W.⁴

11
- 0028763845
- E. Werwa, A.A. Seraphin, L.A. Chin, C. Zhou, and K.D. Kolenbrander Appl. Phys. Lett. 64 1994 1821
- (1994) Appl. Phys. Lett. , vol.64 , pp. 1821
- Werwa, E.¹ Seraphin, A.A.² Chin, L.A.³ Zhou, C.⁴ Kolenbrander, K.D.⁵

12
- 42749099678
- M. Dovrat, Y. Goshen, J. Jedrzejewski, I. balberg, and A. Sa'ar Phys. Rev. B 69 2004 155311
- (2004) Phys. Rev. B , vol.69 , pp. 155311
- Dovrat, M.¹ Goshen, Y.² Jedrzejewski, J.³ Balberg, I.⁴ Sa'Ar, A.⁵

13
- 0032157520
- H. Seifarth, R. Grötzschel, A. Markwitz, W. Matz, P. Nitzsche, and L. Rebohle Thin Solid Films 330 1998 202
- (1998) Thin Solid Films , vol.330 , pp. 202
- Seifarth, H.¹ Grötzschel, R.² Markwitz, A.³ Matz, W.⁴ Nitzsche, P.⁵ Rebohle, L.⁶

14
- 0000992049
- R. Tohmon, R. Shimogaichi, S. Munekuni, Y. Ohki, and Y. Hama Appl. Phys. Lett. 54 1989 1650
- (1989) Appl. Phys. Lett. , vol.54 , pp. 1650
- Tohmon, R.¹ Shimogaichi, R.² Munekuni, S.³ Ohki, Y.⁴ Hama, Y.⁵

15
- 1942525429
- N.A. Hill, and K.B. Whaley J. Electron. Mater. 25 1996 269
- (1996) J. Electron. Mater. , vol.25 , pp. 269
- Hill, N.A.¹ Whaley, K.B.²

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