High rate growth of thick diamond films by high-current hot-cathode PCVD

Journal of Crystal Growth

Volumn 280, Issue 3-4, 2005, Pages 539-544

  Bai, Yizhen ^a   Jin, Zengsun ^b   Lv, Xianyi ^b   Jiang, Zhigang ^b   Han, Xuemei ^b   Wang, Jiayu ^b   Wu, Hanhua ^b  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b JILIN UNIVERSITY   (China)

Author keywords

A1. Deposition rate; A1. Thermal conductivity; A3. Chemical vapor deposition processes; B1. Diamond films

Indexed keywords

CATHODES; DIAMOND FILMS; ELECTRIC CURRENTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THERMAL CONDUCTIVITY; THICK FILMS;

DISCHARGE CURRENTS; FLOW RATES; THERMAL MANAGEMENT; THICK DIAMOND FILMS;

FILM GROWTH;

EID: 20344397981     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.04.008     Document Type: Article

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