The deposition of diamond film with high thermal conductivity

Thin Solid Films

Volumn 311, Issue 1-2, 1997, Pages 124-127

  Gu, Changzhi ^a   Jin, Zengsun ^a   Lu, Xianyi ^a   Zou, Guangtian ^a   Zhang, Jifa ^b   Fang, Rongchuan ^b  

^a JILIN UNIVERSITY   (China)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Chemical vapour deposition (CVD); Diamond; Grain boundary; Impurities

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTAL IMPURITIES; CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; GRAIN BOUNDARIES; METHANE; PLASMA APPLICATIONS; SYNTHESIS (CHEMICAL); THERMAL CONDUCTIVITY; THERMAL VARIABLES MEASUREMENT; THICKNESS MEASUREMENT;

PHOTOTHERMAL DEFLECTION METHOD;

DIAMOND FILMS;

EID: 0031340097     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00447-1     Document Type: Article

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