Reactive ion etching of diamond as a means of enhancing chemically-assisted mechanical polishing efficiency

Diamond and Related Materials

Volumn 6, Issue 8, 1997, Pages 952-958

  Sirineni, Gopi M R ^a   Naseem, H A ^a   Malshe, A P ^a   Brown, W D ^a  

^a 3202 Bell Engineering Center   (United States)

Author keywords

Etching; Oxygen; Reactive ion plasma; Synthetic diamond

Indexed keywords

EID: 0042764725     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(96)00767-4     Document Type: Article

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