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Volumn 45, Issue 7-8, 2005, Pages 1161-1166

Effect of localized traps on the anomalous behavior of the transconductance in nanocrystalline TFTs

Author keywords

Amorphous and nanocrystalline silicon; Density of states distribution; TFT

Indexed keywords

AMORPHOUS SILICON; CRYSTALLIZATION; ELECTRIC CURRENTS; ELECTRON TRAPS; ELECTRONIC DENSITY OF STATES; HYDROGENATION; MICROELECTRONICS; NANOSTRUCTURED MATERIALS; POLYCRYSTALLINE MATERIALS; POLYSILICON; TRANSCONDUCTANCE;

EID: 20344387816     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2004.12.005     Document Type: Article
Times cited : (9)

References (9)
  • 2
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    • Effects of impurity concentration, hydrogen plasma process and crystallization temperature on poly-crystalline films obtained from PECVD a-Si:H layers
    • R. García, M. Estrada, and A. Cerdeira Effects of impurity concentration, hydrogen plasma process and crystallization temperature on poly-crystalline films obtained from PECVD a-Si:H layers Microelec Reliab 43 2003 1281 1287
    • (2003) Microelec Reliab , vol.43 , pp. 1281-1287
    • García, R.1    Estrada, M.2    Cerdeira, A.3
  • 3
    • 0035247558 scopus 로고    scopus 로고
    • Analysis of bias stress on thin-film transistors obtained by hot-wire chemical vapor deposition
    • D.K. Dosev, J. Pûigdollers, A. Oropesa, C. Voz, M. Fonrodona, and D. Soler Analysis of bias stress on thin-film transistors obtained by hot-wire chemical vapor deposition Thin Solid Films 383 2001 307 309
    • (2001) Thin Solid Films , vol.383 , pp. 307-309
    • Dosev, D.K.1    Pûigdollers, J.2    Oropesa, A.3    Voz, C.4    Fonrodona, M.5    Soler, D.6
  • 4
    • 5844321308 scopus 로고    scopus 로고
    • Device-quality polycrystalline and amorphous silicon films by hot-wire chemical vapor deposition
    • R.E.I. Schropp, K.F. Feenestra, E.C. Molenbroek, H. Meiling, and J.K. Rath Device-quality polycrystalline and amorphous silicon films by hot-wire chemical vapor deposition Phys Mag B 76 1997 309 321
    • (1997) Phys Mag B , vol.76 , pp. 309-321
    • Schropp, R.E.I.1    Feenestra, K.F.2    Molenbroek, E.C.3    Meiling, H.4    Rath, J.K.5
  • 8
    • 0028447975 scopus 로고
    • An efficient analytical model for calculating trapped charge in amorphous silicon
    • Y.T. Tsai, K.D. Hong, and Y.L. Yuan An efficient analytical model for calculating trapped charge in amorphous silicon IEEE Trans CAD IC Syst 13 1994 725 728
    • (1994) IEEE Trans CAD IC Syst , vol.13 , pp. 725-728
    • Tsai, Y.T.1    Hong, K.D.2    Yuan, Y.L.3
  • 9
    • 36549093818 scopus 로고
    • New high field-effect mobility regime of amorphous silicon alloy thin film transistor operation
    • M. Shur, C. Hyun, and M. Hack New high field-effect mobility regime of amorphous silicon alloy thin film transistor operation J Appl Phys 59 7 1986 2488 2497
    • (1986) J Appl Phys , vol.59 , Issue.7 , pp. 2488-2497
    • Shur, M.1    Hyun, C.2    Hack, M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.