SCOPUS 정보 검색 플랫폼

Materials Research Society Symposium Proceedings

Volumn 833, Issue , 2005, Pages 49-54

Pulsed DC sputtered aluminum nitride: A novel approach to control stress and c-axis orientation

(6) Soussan, Philippe a O'Donnell, Kathy b D'Haen, Jan c Vanhoyland, Geert d,e Beyne, Eric a Tilmans, Harrie A C a

a IMEC (Belgium)

b Nexx Systems (United States)

c HASSELT UNIVERSITY (Belgium)

d RESEARCH FOUNDATION FLANDERS FWO (Belgium)

e HASSELT UNIVERSITY (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL REARRANGEMENT; CRYSTALLINITY; FILM DEPOSITION; MAGNETRON REACTIVE SPUTTERING;

ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; FILM GROWTH; ION BOMBARDMENT; NUCLEATION; PIEZOELECTRIC MATERIALS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; THERMAL EFFECTS; THIN FILMS;

ALUMINUM NITRIDE;

EID: 20344386963 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (3)

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