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Volumn , Issue , 2003, Pages 162-163

Self-heating effects on strained Si/SiGe n-HFETs

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; NOISE FIGURE; SEMICONDUCTOR DEVICES; SILICON; SILICON ALLOYS; TRANSPORT PROPERTIES;

EID: 20344386558     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISDRS.2003.1272042     Document Type: Conference Paper
Times cited : (2)

References (9)
  • 1
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    • M Zeuner, et al.Sub-100mn Gate Technologies for Si/SiGe-Buried-Channel RF Devices", Jpn. J. Appl Phys., 42(4B), 2363-2366, 2003.
    • (2003) Jpn. J. Appl Phys. , vol.42 , Issue.4 B , pp. 2363-2366
    • Zeuner, M.1
  • 2
    • 0037290322 scopus 로고    scopus 로고
    • High performance 100 nm t-gate strained si/sio sgeoj n-modfet
    • F Aniel, et al. "High performance 100 nm T-gate strained Si/Sio sGeoj n-MODFET", Salid State Electro, 47, 283-289, 2003.
    • (2003) Salid State Electro , vol.47 , pp. 283-289
    • Aniel, F.1
  • 3
    • 0037426969 scopus 로고    scopus 로고
    • Dc and high frequency performance of a 0.1 μm n-type si/si0.6 ge 0.4modfet wilh/uiy 198 ghz at 300 k and fmax = 230 ghz at 50 k
    • M. Enciso-Aguiiar et al., "DC and high frequency performance of a 0.1 μm n-type Si/Si0.6 Ge 0.4MODFET wilh/uiy 198 GHz at 300 K and fmax = 230 GHz at 50 K", Elect. Letters, 39 (1), 149-151, 2003.
    • (2003) Elect. Letters , vol.39 , Issue.1 , pp. 149-151
    • Enciso-Aguiiar, M.1
  • 4
    • 0035899208 scopus 로고    scopus 로고
    • 0.3 Db minimum noise figure of 0.13 nm gate-length strained si/sin 5igeo n-modfets
    • M. Encisoei et al. "0.3 dB minimum noise figure of 0.13 nm gate-length strained Si/Sin 5iGeo n-MODFETs", Elect Letters, vol. 37 (17), 1089-1090, 2001.
    • (2001) Elect Letters , vol.37 , Issue.17 , pp. 1089-1090
    • Encisoei, M.1
  • 5
    • 0038036595 scopus 로고    scopus 로고
    • High frequency n-type modfets on ultra-thin virtual sige substrates
    • T. Hackbarth et al."High frequency n-type MODFETs on ultra-thin virtual SiGe substrates, Solid-Siuie Ekclmnws, Volume 47(7), 1179-1182, 2003.
    • (2003) Solid-Siuie Ekclmnws , vol.47 , Issue.7 , pp. 1179-1182
    • Hackbarth, T.1
  • 6
    • 0037074813 scopus 로고    scopus 로고
    • Low energy plasma enhanced chemical vapor deposition1'
    • M.Krummer et al. "Low energy plasma enhanced chemical vapor deposition1', Mat. Sc. and Eng. B89, 288, 2002.
    • (2002) Mat. Sc. and Eng. , vol.B89 , pp. 288
    • Krummer, M.1
  • 7
    • 0036687567 scopus 로고    scopus 로고
    • Si/sige n-modfets on thin sige virtual substrates prepared by means of he implantation
    • Herzog, et al."Si/SiGe n-MODFETs on thin SiGe virtual substrates prepared by means of He implantation" IEEE Electron Device Lett., 23 (8), 485-487, 2002.
    • (2002) IEEE Electron Device Lett , vol.23 , Issue.8 , pp. 485-487
    • Herzog1
  • 8
    • 0037074851 scopus 로고    scopus 로고
    • Thin sige buffers with high oe content for n-mosfets
    • K. Lyutovich et al., "Thin SiGe buffers with high Oe content for n-MOSFETs", Mat Set. Eng. B89, 341, 2002.
    • (2002) Mat Set. Eng. , vol.B89 , pp. 341
    • Lyutovich, K.1
  • 9
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    • Measurements of the effect of self-heating tn strained silicon mosfets
    • K A Jenkings, K. Rim "Measurements of the Effect of Self-Heating tn Strained Silicon MOSFETs" IEEE Electron Dev.. 23(6), 360-362, 2002.
    • (2002) IEEE Electron Dev , vol.23 , Issue.6 , pp. 360-362
    • Jenkings, K.A.1    Rim, K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.