Ion-irradiation-induced preferential amorphization of Ge nanocrystals in silica

Physical Review B - Condensed Matter and Materials Physics

Volumn 71, Issue 9, 2005, Pages

  Ridgway, M C ^a   Azevedo, G DeM ^b   Elliman, R G ^a   Glover, C J ^a   Llewellyn, D J ^a   Miller, R ^a,e   Wesch, W ^a,f   Foran, G J ^c   Hansen, J ^d   Nylandsted Larsen, A ^d  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^b LABORATÓRIO NACIONAL DE LUZ SÍNCROTRON   (Brazil)

^c AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

^d AARHUS UNIVERSITY   (Denmark)

^e UNIVERSITY OF AUGSBURG   (Germany)

^f FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

GERMANIUM; SILICON DIOXIDE;

ARTICLE; CRYSTAL STRUCTURE; CRYSTALLIZATION; ENERGY; IRRADIATION; NORMAL DISTRIBUTION; STRUCTURE ANALYSIS;

EID: 20344370955     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.71.094107     Document Type: Article

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