Structural perturbations within Ge nanocrystals in silica

Applied Physics Letters

Volumn 84, Issue 2, 2004, Pages 278-280

  Cheung, A ^a   Azevedo, G De M ^a,b   Glover, C J ^a   Llewellyn, D J ^a   Elliman, R G ^a   Foran, G J ^b   Ridgway, M C ^c  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^b AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

^c LABORATÓRIO NACIONAL DE LUZ SÍNCROTRON   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMS; COMPUTER SIMULATION; CRYSTAL MICROSTRUCTURE; GRAIN SIZE AND SHAPE; INTERFACES (MATERIALS); ION IMPLANTATION; MOLECULAR DYNAMICS; SEMICONDUCTING GERMANIUM; SILICA; THERMOOXIDATION; X RAY SPECTROSCOPY;

BONDING DISTORTION; EXTENDED X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY; GERMANIUM NANOCRYSTAL; MATRIX INDUCED COMPRESSION; MULTIPLE PHASE; NANOCRYSTAL INTERATOMIC DISTANCE; NANOCRYSTAL SIZE;

NANOSTRUCTURED MATERIALS;

EID: 0842333233     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1639136     Document Type: Article

References (10)

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