Hydroxyl group-induced adsorptions of 4-nitro benzoic acid on the Si(1 0 0) surface

Journal of Electron Spectroscopy and Related Phenomena

Volumn 144-147, Issue , 2005, Pages 397-400

  Ihm, Kyuwook ^a   Kang, Tai Hee ^a   Han, Jin Hee ^b   Moon, Sangwoon ^b   Hwang, Chan Cuk ^a   Kim, Ki Jeong ^a   Hwang, Han Na ^a   Jeon, Cheol Ho ^c   Kim, Hyeong Do ^a   Kim, Bongsoo ^a,b   Park, Chong Yun ^c  

^a POSTECH   (South Korea)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

^c Sungkyunkwan University   (South Korea)

Author keywords

Aromatic; Chemisorption; Near edge extended X ray absorption fine structure (NEXAFS)

Indexed keywords

CARBOXYLIC ACIDS; CHEMICAL BONDS; CHEMISORPTION; DEHYDRATION; DIMERS; PHOTONS; SILICON; X RAYS;

DEPROTONATION; MONOCHROMATIC BEAMS; NANO-SCALE STRUCTURES; NEAR-EDGE EXTENDED X RAY ABSORPTION FINE STRUCTURE (NEXAFS);

ADSORPTION;

EID: 20244380046     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2005.01.108     Document Type: Conference Paper

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