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Volumn 16, Issue 2, 2005, Pages 167-170

Structure studies of microcrystalline silicon thin film using Raman scattering and photo thermal deflection spectra

Author keywords

Microcrystalline silicon ( c Si) thin film; Photo thermal deflection spectra (PDS); Raman scattering spectra

Indexed keywords

CRYSTALLINE MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; SILICON; SOLAR CELLS; SUBSTRATES;

EID: 20144388049     PISSN: 10050086     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (7)

References (11)
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    • Microstructures of the microcrystalline silicon thin films prepared by hot-wire chemical deposition with hydrogen dilution
    • Chinese source
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    • Bangkok, Thailand
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    • ZHANG Xiao-dan, ZHAO Ying, ZHU Feng, et al. Study on the properties of silicon-based films with high growth rate fabricated by VHF-PECVD at low-temperature[J]. Journal of Optoelectronics · Laser, 2004, 15(5): 507-511. (in Chinese)
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  • 8
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    • Investigation on the oxygen contamination during the deposition of μc-Si:H thin film by VHF-PECVD
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.