Microstructures of the micro-crystalline silicon thin films prepared by hot wire chemical deposition with hydrogen dilution

Wuli Xuebao/Acta Physica Sinica

Volumn 47, Issue 9, 1998, Pages 1546-1547

  Guo, Xiao Xu ^a,b   Zhu, Mei Fang ^a,b   Liu, Jin Long ^a,b   Han, Yi Qin ^a,b   Xu, Huai Zhe ^a,b   Dong, Bao Zhong ^c   Shen, Wen Jun ^c   Han, He Xiang ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b INSTITUTE OF SEMICONDUCTORS   (China)

^c INSTITUTE OF HIGH ENERGY PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347503012     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

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2. J. Cifre, J. Bertomeu et al., Appl. Phys., A59 (1994), 645.
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4. D. L.Williamson, Appl. Phys. Lett., 67 (1995), 226.
5. V.Gerold, in Small Angle X-ray Scattering, edited by H. Brumberger (Gordon and Breach, New York, 1967). p. 277.
6. J. H. Zhou et al., Mater. Res. Soc. Proc. Pittsburgh, 1996, p. 3.