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Volumn 5645, Issue , 2005, Pages 289-298

EUV/soft X-ray multilayer optics

Author keywords

Barrier layers; Broadband mirror; EUV; Interface engineered mirrors; Laterally graded coatings; Mo Si; Narrowband mirror; Thermal stability

Indexed keywords

BANDWIDTH; COATINGS; INTERFACES (MATERIALS); LIGHT REFLECTION; MAGNETRON SPUTTERING; MICROSTRUCTURE; MIRRORS; MOLYBDENUM; OPTICAL PROPERTIES; SILICON; THERMODYNAMIC STABILITY; ULTRAVIOLET RADIATION; X RAY OPTICS;

EID: 20044385101     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.579520     Document Type: Conference Paper
Times cited : (14)

References (17)
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  • 2
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  • 6
    • 0036614411 scopus 로고    scopus 로고
    • Mo/Si multilayers with different barrier layers for applications as EUV mirrors
    • St. Braun, H. Mai, M Moss, R. Scholz, A. Leson "Mo/Si multilayers with different barrier layers for applications as EUV mirrors" J J Appl Phys 41, 4074-4081, 2002
    • (2002) J J Appl Phys , vol.41 , pp. 4074-4081
    • Braun, St.1    Mai, H.2    Moss, M.3    Scholz, R.4    Leson, A.5
  • 7
    • 36549102073 scopus 로고
    • Thermally induced structural modification of MoSi multilayers
    • D. G. Stearns, M. B. Stearns, Y. Cheng, J. H. Stith, N. M. Ceglio, "Thermally induced structural modification of MoSi multilayers", J. Appl. Phys., Vol. 67, No. 5, pp. 2415-2427, 1990
    • (1990) J. Appl. Phys. , vol.67 , Issue.5 , pp. 2415-2427
    • Stearns, D.G.1    Stearns, M.B.2    Cheng, Y.3    Stith, J.H.4    Ceglio, N.M.5
  • 8
    • 0000254510 scopus 로고    scopus 로고
    • Thermal stability of Mo/C/Si/C multilayer soft X-ray mirrors
    • H. Takenaka and T. Kawamura "Thermal Stability of Mo/C/Si/C Multilayer Soft X-ray Mirrors", J. of Elec. Spec. and Rel. Phenom., Vol. 80, pp. 381-384, 1996
    • (1996) J. of Elec. Spec. and Rel. Phenom. , vol.80 , pp. 381-384
    • Takenaka, H.1    Kawamura, T.2
  • 9
    • 0035450636 scopus 로고    scopus 로고
    • Heat resistance of EUV multilayer mirrors for long-time applications
    • T. Feigl, H. Lauth, S. Yulin, N. Kaiser "Heat resistance of EUV multilayer mirrors for long-time applications", Microelectronic Engineering 57-58, pp. 3-8, 2001.
    • (2001) Microelectronic Engineering , vol.57-58 , pp. 3-8
    • Feigl, T.1    Lauth, H.2    Yulin, S.3    Kaiser, N.4
  • 10
    • 0032614398 scopus 로고    scopus 로고
    • Highly repetitive, extreme ultraviolet radiation source based on a gas-discharge plasma
    • K. Bergmann, G. Schriever, O. Rosier, M. Müller, W. Neff, R. Lebert, "Highly repetitive, extreme ultraviolet radiation source based on a gas-discharge plasma", Applied Optics 38, 5413-5417, 1999
    • (1999) Applied Optics , vol.38 , pp. 5413-5417
    • Bergmann, K.1    Schriever, G.2    Rosier, O.3    Müller, M.4    Neff, W.5    Lebert, R.6
  • 17
    • 13444313152 scopus 로고    scopus 로고
    • Multilayer coatings for EUV/soft X-ray mirrors
    • (Eds. N. Kaiser and H. Pulker), Springer Series in Photonics
    • S. Yulin "Multilayer coatings for EUV/Soft X-ray Mirrors" in Optical Interference Coatings (Eds. N. Kaiser and H. Pulker), Springer Series in Photonics, 2003
    • (2003) Optical Interference Coatings
    • Yulin, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.