Repair of step and flash imprint lithography templates

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3306-3311

  Dauksher, W J ^a   Nordquist, K J ^a   Le, N V ^a   Gehoski, K A ^a   Mancini, D P ^a   Resnick, D J ^a   Casoose, L ^b   Bozak, R ^c   White, R ^c   Csuy, J ^c   Lee, D ^c  

^a MOTOROLA INC   (United States)

^b FREESCALE SEMICONDUCTOR INC   (United States)

^c RAVE LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMPRINT MONOMER; INFRASTRUCTURE; PATTERN TRANSFER; STEP AND FLASH IMPRINT LITHOGRAPHY (S-FIL);

ATOMIC FORCE MICROSCOPY; CRYSTALS; ELECTRON BEAMS; MONOMERS; PHOTONS; PHOTOSENSITIVITY; VISCOSITY;

LITHOGRAPHY;

EID: 19944430560     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1815300     Document Type: Conference Paper

References (6)

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