Electron holography and AFM studies on styrenic block copolymers and a high impact polystyrene

Journal of Applied Polymer Science

Volumn 96, Issue 5, 2005, Pages 1573-1583

  Simon, Paul ^a,d   Adhikari, Rameshwar ^b   Lichte, Hannes ^a   Michler, Goerg H ^b   Langela, Marc ^c  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

^c POLYMATERIALS AG   (Germany)

^d MAX PLANCK INSTITUTE FOR CHEMICAL PHYSICS OF SOLIDS   (Germany)

Author keywords

Atomic force microscopy (AFM); Block copolymers; Electron holography; Polymer blends; Transmission electron microscopy (TEM)

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON HOLOGRAPHY; HOLOGRAMS; IMAGING TECHNIQUES; POLYMER BLENDS; POLYSTYRENES; SENSITIVITY ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY;

FOCUS VARIATION; MICROSCOPIC TOOLS; POLYMER SYSTEMS; SCATTERING CONTRAST;

BLOCK COPOLYMERS;

POLYSTYRENE;

EID: 19944367022     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/app.21600     Document Type: Article

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